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Volumn 53, Issue 1, 2006, Pages 109-111

Highly scalable ballistic injection AND-type (BiAND) flash memory

Author keywords

AND type array; Ballistic; Flash memory; Split gate flash

Indexed keywords

COMPUTER PROGRAMMING; ELECTRIC CURRENTS; ELECTRON INJECTION; LOGIC GATES; TRENCHING;

EID: 33947694327     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2005.860636     Document Type: Article
Times cited : (6)

References (13)
  • 1
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    • (1989) IEDM Tech. Dig , pp. 603-606
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  • 3
    • 33747184810 scopus 로고
    • 2 contactless memory cell technology for a 3 V-only 64 Mbit EEPROM
    • 2 contactless memory cell technology for a 3 V-only 64 Mbit EEPROM," in IEDM Tech. Dig., 1992, pp. 991-993.
    • (1992) IEDM Tech. Dig , pp. 991-993
    • Kume, H.1
  • 4
    • 4243660514 scopus 로고
    • 2 self-aligned contactless memory cell technology suitable for 256-Mbit Flash memories
    • 2 self-aligned contactless memory cell technology suitable for 256-Mbit Flash memories," in IEDM Tech. Dig., 1994, pp. 921-923.
    • (1994) IEDM Tech. Dig , pp. 921-923
    • Kato, M.1
  • 6
    • 33947679546 scopus 로고
    • An asymmetrical offset source/drain structure for virtual ground array Flash memory with DINOR operation
    • M. Ohi, A. Fukumoto, Y. Kunori, H. Onoda, N. Ajika, M. Hatanaka, and H. Miyoshi, "An asymmetrical offset source/drain structure for virtual ground array Flash memory with DINOR operation," in Symposium VLSI Tech., 1993, pp. 57-58.
    • (1993) Symposium VLSI Tech , pp. 57-58
    • Ohi, M.1    Fukumoto, A.2    Kunori, Y.3    Onoda, H.4    Ajika, N.5    Hatanaka, M.6    Miyoshi, H.7
  • 7
    • 0026203453 scopus 로고
    • Alternate metal virtual ground (AMG)-A new scaling concept for very high-density EPROMs
    • Sep
    • B. Eitan et al., "Alternate metal virtual ground (AMG)-A new scaling concept for very high-density EPROMs," in IEEE Electron Device Lett., vol. 12, Sep. 1991, pp. 450-452.
    • (1991) IEEE Electron Device Lett , vol.12 , pp. 450-452
    • Eitan, B.1
  • 9
    • 0032255807 scopus 로고    scopus 로고
    • Low voltage, low current, high speed program step split-gate cell with ballistic direct injection for EEPROM/Flash
    • S. Ogura et al., "Low voltage, low current, high speed program step split-gate cell with ballistic direct injection for EEPROM/Flash," in IEDM Tech. Dig., 1998, pp. 987-990.
    • (1998) IEDM Tech. Dig , pp. 987-990
    • Ogura, S.1
  • 10
    • 0023344918 scopus 로고
    • Two-dimensional thermal oxidation of silicon-I. Experiments
    • D. B. Kao, J. P. Mcvittie, W. D. Nix, and K. C. Sarawat, "Two-dimensional thermal oxidation of silicon-I. Experiments," IEEE Trans Elec. Dev., vol. ED-34, p. 1008, 1987.
    • (1987) IEEE Trans Elec. Dev , vol.ED-34 , pp. 1008
    • Kao, D.B.1    Mcvittie, J.P.2    Nix, W.D.3    Sarawat, K.C.4
  • 11
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    • Two-dimensional thermal oxidation of silicon- II. Modeling stress effects in wet oxides
    • _, "Two-dimensional thermal oxidation of silicon- II. Modeling stress effects in wet oxides," IEEE Trans Elec. Dev., vol. ED-35, p. 25, 1988.
    • (1988) IEEE Trans Elec. Dev , vol.ED-35 , pp. 25
    • Kao, D.B.1    Mcvittie, J.P.2    Nix, W.D.3    Sarawat, K.C.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.