Observation of voids formed by annealing in LiNbO3 implanted with Cu ions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 257, Issue 1-2 SPEC. ISS., 2007, Pages 472-475

  Ijima, K ^a   Mitsui, N ^a   Ho, A ^a   Yamanaka, J ^a   Taniguchi, S ^b   Saito, Y ^a  

^a UNIVERSITY OF YAMANASHI   (Japan)

^b TOKYO METROPOLITAN INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Japan)

Author keywords

HADDF; Ion implantation; Lithium niobate; Optical absorption; STEM; Void

Indexed keywords

COPPER; ION IMPLANTATION; LIGHT ABSORPTION; LITHIUM COMPOUNDS; LOW TEMPERATURE EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

CU ION IMPLANTATION; IMPLANTED LAYERS; LITHIUM NIOBATE; SCANNING TRANSMISSION ELECTRON MICROSCOPE (STEM);

RAPID THERMAL ANNEALING;

EID: 33947632575     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.01.126     Document Type: Article

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