Some physics and chemistry of electrosurgical plasma discharges

Contributions to Plasma Physics

Volumn 47, Issue 1-2, 2007, Pages 64-71

  Stalder, K R ^a   Woloszko, J ^a  

^a ArthroCare Corporation   (United States)

Author keywords

Discharges in liquids; Electrosurgery; Microplasmas

Indexed keywords

CHEMICAL MODIFICATION; ELECTRIC DISCHARGES; ELECTRONS; KINETIC ENERGY; KINETICS; METAMATERIALS; PLASMA DEVICES; POTENTIAL ENERGY; SURGERY;

DISCHARGE IN LIQUID; ELECTRICAL DISCHARGES; ENERGETIC ELECTRON; MICRO-PLASMAS; NON EQUILIBRIUM; OPTICAL SPECTROSCOPY; PLASMA DISCHARGE; SALINE ENVIRONMENT; SURGICAL PROCEDURES; TISSUE SURFACE;

TISSUE;

EID: 33947136755     PISSN: 08631042     EISSN: 15213986     Source Type: Journal    
DOI: 10.1002/ctpp.200710010     Document Type: Conference Paper

References (23)

1. S.V. Pollack, A. Carruthers, and R.C. Grekin, Dermatol. Surg., 26, 904-908 (2000).
2. J.D. Polousky, T.P. Hedman, C.T. Vangesness, Jr., Arthroscopy: The Journal of Arthroscopic and Related Surgery, 16, 813-821 (2000).
3. J. Woloszko, M. Kwende, and K.R. Stalder, Proc. SPIE, 4949, 341-352 (2003).
4. I.E. Kieft, E.P. van der Laan and E. Stoffels, New Journal of Physics, 6, 149 (2004).
5. K.R. Stalder, J. Woloszko, I.G. Brown, and C.D. Smith, Appl. Phys. Lett., 79, 4503-4505 (2001).
6. J. Woloszko, K.R. Stalder, and I.G. Brown, IEEE Trans. Plasma Sci., 30, 1376-1383 (2002).
7. S.V. Belov, Biomedical Engineering, 28, 80-85 (2004). Translated from Meditsinskaya Tekhnika, 28, 25-30 (2004).
8. K.R. Stalder, D.F. McMillen, and J. Woloszko, J. Phys. D: Appl. Phys., 38, 1728-1738 (2005).
9. D. Emfietzoglou, Radiation Physics and Chemistry, 66, 373-385 (2003).
10. M.-A. Herve du Penhoat, T. Goulet, Y. Frongillo, M.-J. Fraser, P. Bernat, and J.-P. Jay-Geran, J. Phys. Chem. A, 104, 11757-11770 (2000).
11. H. Abdoul-Carime and L. Sanche, J. Phys. Chem. B, 108, 457-464 (2004).
12. th century - water vapour - " National Institute for Fusion Science, Report NIFS-DATA-81 (December 2003).
13. J. Kurawaki, K. Ueki, M. Higo, and T. Ogawa, J. Chem. Phys. 78, part 1, 3071-3077, (1983).
14. J.D. Gorfinkiel, L.A. Morgan, and J. Tennyson, J. Phys. B: At. Mol. Opt. Phys. 38, 543-555 (2002).
15. F. Edery and A. Kanaev, Eur. Phys. J. D, 23, 257-264 (2003).
16. C.I.M. Beenakker, F.J. De Heer, H.B. Krop, and G.R. Mohlmann, Chem. Phys., 6, 445-454 (1974).
17. G.R. Mohlmann and F.J. DeHeer, Chem. Phys. 40, 157-162 (1979).
18. T. Harb, W. Kedsierski, and J.W. McConkey, J. Chem. Phys. 115, 5507-5512 (2001).
19. K. Becker, B. Stumpf, and G. Schulz, Chem. Phys. Lett., 73, 102-105 (1980).
20. U. Muller, Th. Bubel, and G. Schulz, Z. Phys. D 25, 167-174 (1993).
21. T.J. Sommerer and M.J. Kushner, J. Appl. Phys. 70, 1240-1251 (1991).
22. K. Kobayashi, Y. Tomita and M. Sanmayo, J. Phys. Chem. B 104, 6318-6326 (2000).
23. V.L. Bychkov and V.A. Yurovskii, Institute of High Temperatures, Russian Academy of Sciences (Translated from Teplofizika Vysokikh Temperatur, 31, no. 1, 8-17 (1993).