Passivation effect on the liquid crystal alignment on a-C:H films: A two-step treatment by argon and hydrogen plasma beam scanning

Journal of Applied Physics

Volumn 101, Issue 2, 2007, Pages

  Wu, K Y ^a   Chang, S J ^a   Hwang, J ^a   Lee, C Y ^b   Tang, H C ^b   Chen, C W ^b   Liu, C H ^b   Wei, H K ^a   Kou, C S ^a   Lee, C D ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL BONDS; NEMATIC LIQUID CRYSTALS; PASSIVATION; PLASMA FLOW; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL BONDING; LIQUID CRYSTAL ALIGNMENT; PLASMA BEAM SCANNING; PRETILT ANGLE;

CRYSTAL STRUCTURE;

EID: 33847765396     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2432044     Document Type: Article

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