Oscillatory behavior of coercivity in Bi/Co bilayers

Journal of Magnetism and Magnetic Materials

Volumn 310, Issue 2 SUPPL. PART 3, 2007, Pages 2239-2241

  Hsu, Jen Hwa ^a   Xue, Zhi Long ^a   Huang, Ta Chieh ^a   Wei, Zung Hang ^b   Lai, Mei Feng ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Interface structure and roughness; Magnetic film and multilayer; Magnetic property; Semimetal

Indexed keywords

BISMUTH; COBALT; COERCIVE FORCE; FILM GROWTH; MAGNETRON SPUTTERING; METALLOIDS; OSCILLATORS (MECHANICAL);

COBALT FILMS; GROWING MECHANISM; INTERFACE STRUCTURES; ROOM TEMPERATURE;

MAGNETIC FILMS;

EID: 33847688394     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2006.10.876     Document Type: Article

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