The surface modification of nanoporous SiO x thin films with a monofunctional organosilane

Applied Surface Science

Volumn 252, Issue 5, 2005, Pages 1197-1201

  Yang, D Q ^a   Meunier, M ^a   Sacher, E ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

Nanoporous silicon; Photoacoustic FTIR; Surface chemical modification; XPS

Indexed keywords

ALCOHOLS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SILANES; SILICA; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOPOROUS SILICON; ORGANOSILANE; PHOTOACOUSTIC FTIR; SURFACE CHEMICAL MODIFICATION;

THIN FILMS;

EID: 27944467475     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.02.095     Document Type: Article

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