Magnetic and electric properties of Fe-doped ITO thin films

Journal of Magnetism and Magnetic Materials

Volumn 310, Issue 2 SUPPL. PART 3, 2007, Pages

  Ohno, T ^a   Kawahara, T ^a   Murasugi, M ^a   Tanaka, H ^a   Kawai, T ^a   Kohiki, S ^b  

^a OSAKA UNIVERSITY   (Japan)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Fe doped ITO film; Magnetic iron oxide cluster; Pulsed laser deposition; Room temperature ferromagnetism

Indexed keywords

DOPING (ADDITIVES); ELECTRIC PROPERTIES; EPITAXIAL GROWTH; FERROMAGNETIC MATERIALS; FERROMAGNETISM; INDIUM COMPOUNDS; IRON; IRON OXIDES; PARTIAL PRESSURE; PULSED LASER DEPOSITION;

MAGNETIC IRON OXIDE CLUSTERS; OXYGEN PARTIAL PRESSURE; ROOM TEMPERATURE FERROMAGNETISM;

THIN FILMS;

EID: 33847621137     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2006.10.781     Document Type: Article

References (1)

1. Toyosaki H., Fukumura T., Yamada Y., Nakajima K., Chikyow T., Hasegawa T., Koinuma H., and Kawasaki M. Nat. Mater. 3 (2004) 221