Effects of structural nonplanarity on the magnetoresistance of Permalloy circular rings

Journal of Applied Physics

Volumn 101, Issue 4, 2007, Pages

  Vavassori, P ^a   Busato, A ^b   Chiapatti, A ^b   Di Bona, A ^a   Valeri, S ^a   Metlushko, V ^c   Ilic, B ^d  

^a CNR Consiglio Nazionale delle Ricerche   (Italy)

^b UNIVERSITY OF FERRARA   (Italy)

^c 1120 Science and Engineering Offices   (United States)

^d Department of Theoretical and Applied Mechanics and the Cornell Nanofabrication Facility   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM THICKNESS; IRON ALLOYS; MAGNETORESISTANCE; NANOLITHOGRAPHY; NICKEL ALLOYS; SUBSTRATES;

NANOCONTACTS; PERMALLOY CIRCULAR RINGS; RING STRUCTURES; STRUCTURAL NONPLANARITY;

NANORINGS;

EID: 33847616520     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2472653     Document Type: Article

References (12)

1. T. Shinjo, T. Okuno, R. Hassdorf, K. Shigeto, and T. Ohno, Science 289, 5481 (2000).
2. R. P. Cowburn, D. K. Koltsov, and A. O. Adeyeye, Phys. Rev. Lett. 83, 1042 (1999).
3. M. Kläui, C. A. F. Vaz, J. A. C. Bland, W. Wernsdorfer, G. Faini, and E. Cambril, Appl. Phys. Lett. 0003-6951 10.1063/1.1490626 81, 108 (2002); M. Kläui, C. Vaz, J. Rothman, J. Bland, W. Wernsdorfer, G. Faini, and E. Cambril, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.90.097202 90, 097202 (2003); D. Buntinx, A. Volodin, and C. Van Hasendonck, Phys. Rev. B 70, 224405 (2004).
4. M. Kläui, C. A. F. Vaz, J. A. C. Bland, W. Wernsdorfer, G. Faini, and E. Cambril, Appl. Phys. Lett. 0003-6951 10.1063/1.1490626 81, 108 (2002); M. Kläui, C. Vaz, J. Rothman, J. Bland, W. Wernsdorfer, G. Faini, and E. Cambril, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.90.097202 90, 097202 (2003); D. Buntinx, A. Volodin, and C. Van Hasendonck, Phys. Rev. B 70, 224405 (2004).
5. M. Kläui, C. A. F. Vaz, J. A. C. Bland, W. Wernsdorfer, G. Faini, and E. Cambril, Appl. Phys. Lett. 0003-6951 10.1063/1.1490626 81, 108 (2002); M. Kläui, C. Vaz, J. Rothman, J. Bland, W. Wernsdorfer, G. Faini, and E. Cambril, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.90.097202 90, 097202 (2003); D. Buntinx, A. Volodin, and C. Van Hasendonck, Phys. Rev. B 70, 224405 (2004).
6. P. Vavassori, M. Grimsditch, V. Metlushko, N. Zaluzec, and B. Ilic, Appl. Phys. Lett. 86, 072507 (2005).
7. M. Kläui, Phys. Rev. Lett. 94, 106601 (2005).
8. M. C. Gaidis, IBM J. Res. Dev. 50, 41 (2006).
9. W. J. Gallagher and S. S. P. Parkin, IBM J. Res. Dev. 50, 5 (2006).
10. B. D. Schrag, Appl. Phys. Lett. 77, 2373 (2000).
11. M. J. Donahue and D. G. Porter, OOMMF User's Guide, Version 1.2 alpha 3, NIST, Gaithersburg MD, 2002).
12. T. R. McGuire and R. I. Potter, IEEE Trans. Magn. 34, 1090 (1975).