Field enhanced rapid thermal process for low temperature poly-Si TFTs fabrications

Proceedings of International Meeting on Information Display

Volumn 1, Issue , 2006, Pages 665-667

  Kim, Hyoung June ^a   Shin, Dong Hoon ^a  

^a Viatron Technologies Corp   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

GATES (TRANSISTOR); GLASS; HYDROGENATION; POLYSILICON; PROGRAM PROCESSORS; TEMPERATURE CONTROL; THIN FILM TRANSISTORS;

DOPANT ACTIVATION; POLY-SI FILMS; RAPID THERMAL PROCESSORS; VIATRON TECHNOLOGIES (CO);

RAPID THERMAL ANNEALING;

EID: 33847343528     PISSN: 17387558     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. Jun, S. I., Yang, Y. H., Lee, J.B., and Choi, D.K. Appl.Phys. Lett. 75, 15 (1999)
2. Ahn, J.H., Lee, J.N., Kim, Y.C., and Ahn, B.T., Curr. Appl. Phys. 2, 135 (2002).
3. Yoon, S.Y., Park, S.J., Kim, K.H., and Jang, J., Thin Solid Films 383, 34 (2001).
4. Park, S.H., Kim, H.J., Kang, K.H., Lee, J.S., Choi, Y.K., and Kwon, O.M., J. Appl. Phys. 38, 1511 (2005)