Defect control of immersion lithography with top coat material

Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference

Volumn 2005, Issue , 2005, Pages 54-55

  Ando, Tomoyuki ^a   Takayama, Toshikazu ^a   Tsuji, Hiromitsu ^a   Ishizuka, Keita ^a   Yoshida, Masaaki ^a   Hirano, Tomoyuki ^a   Yokoya, Jiro ^a   Ohmori, Katsumi ^a  

^a TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33847240957     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/imnc.2005.203734     Document Type: Conference Paper

References (8)

1. B. J. Lin, Journal of Microlithography, Microfabrication, and Microsystems, 3 (2004) 533.
2. B. J. Lin, ibid, 3 (2002) 7.
3. R. R. Kunz et al, ibid 3 (2004) 73.
4. J. H. Chen et al, Proc. SPIE, 5754 (13) 2005.
5. D. Gil et al, Proc. SPIE, 5754 (119) 2005.
6. D. Kawamura et al, Proc SPIE, 5753 (818) 2005.
7. H. Tsuji et al, J. Photopolymer Sci. Techno., 18, 5 (641) 2005.
8. S. Owa et al, Proc SPIE, 5754 (655) 2005.