On the solubility and diffusivity of the intrinsic point defects in germanium

Journal of Applied Physics

Volumn 101, Issue 3, 2007, Pages

  Vanhellemont, Jan ^a   Śpiewak, Piotr ^b   Sueoka, Koji ^c  

^a GHENT UNIVERSITY   (Belgium)

^b WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^c OKAYAMA PREFECTURAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL GROWTH; DEFECTS; DIFFUSION; MOLECULAR DYNAMICS; SILICON; SOLUBILITY;

DOPANT DIFFUSION; INTRINSIC POINT DEFECTS; MIGRATION ENERGIES; MOLECULAR DYNAMICS CALCULATIONS;

GERMANIUM;

EID: 33847105439     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2429718     Document Type: Article

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