Aberration correction in electron microscopy

Proceedings of the IEEE Particle Accelerator Conference

Volumn 2005, Issue , 2005, Pages 44-48

  Rose, H ^a   Wan, W ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC FIELDS; ELECTRON MICROSCOPY; ELECTRONS; MIRRORS;

ABERRATION CORRECTION; CHROMATIC ABERRATIONS; ELECTRON MIRRORS; MULTIPOLE CORRECTORS;

ABERRATIONS;

EID: 33847093417     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PAC.2005.1590354     Document Type: Conference Paper

References (9)

1. O. Scherzer, Z. Phys. 101 (1936) 593.
2. O. Scherzer, Optik 2 (1947) 114.
3. H. Rose and D. Krahl, Electron optics of imaging energy filters, in: L. Reimer (Ed.), Energy-Filtering Electron Microscopy, Springer, Berlin, 1995, p.43.
4. J. Zach and M. Haider, Nucl. Instr. and Meth. A 363 (1995) 316.
5. H. Rose, Optik 85 (1990) 19.
6. M. Haider, H. Rose, S. Uhlemann, E. Schwan, B. Kabius, K. Urban, Ultramicroscopy 75 (1998) 52.
7. P.Schlossmacher, A. Thesen, G. Benner, European Semiconductor 27 (2005) 22.
8. D. Preikszas and H. Rose, J. Electron Microsc. 46 (1997) 1.
9. W. Wan, J. Feng, H.A. Padmore, D.S. Robin, Nucl. Instr. and Meth. A 519 (2004) 222.