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Volumn 2006, Issue , 2006, Pages 334-337
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Bias effects on RF passive structures in HR Si substrates
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Author keywords
CPW; Crosstalk; HR silicon; Oxide charges; Quality factor; RF analysis; Substrate losses; Surface conduction
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Indexed keywords
ELECTRIC CONDUCTANCE;
ELECTRIC INDUCTORS;
SILICON ON INSULATOR TECHNOLOGY;
SILICON WAFERS;
WAVEGUIDES;
CPW;
CROSSTALKS;
HR SILICON;
OXIDE CHARGES;
QUALITY FACTORS;
RF ANALYSIS;
SUBSTRATE LOSSES;
SURFACE CONDUCTION;
PASSIVE NETWORKS;
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EID: 33847016498
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/SMIC.2005.1587987 Document Type: Conference Paper |
Times cited : (13)
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References (6)
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