Structure and electrical properties of reactively rf-sputtered nc-TiO 2-δ (-0.04≤δ≤0.2) thin films

ECS Transactions

Volumn 3, Issue 11, 2006, Pages 135-139

  Comedi, D ^a,b   Villafuerte, M ^a   Juarez G ^a   Heluani, S P ^a  

^a UNIVERSIDAD NACIONAL DE TUCUMÁN   (Argentina)

^b Argentina) ^*  (Argentina)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION METHODS; CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY; ELECTRON TRANSPORT PROPERTIES; SPUTTER DEPOSITION; TITANIUM DIOXIDE;

CRYSTALLINE STRUCTURE; DC TRANSPORT; STRUCTURE PROPERTIES;

THIN FILMS;

EID: 33847006899     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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