Precise control of annealed wafer for nanometer devices

ECS Transactions

Volumn 3, Issue 4, 2006, Pages 159-168

  Matsushita, Yoshiaki ^a   Hirasawa, Manabu ^a   Nagahama, Hiromi ^a   Takeda, Ryuji ^a  

^a Nissei Bldg   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; HYDROGEN; MORPHOLOGY; NANOTECHNOLOGY;

HYDROGEN-ANNEALED WAFERS; MOLECULAR ORBITAL CALCULATION; PRECISE CONTROL; SURFACE INDEXES;

SILICON WAFERS;

EID: 33846945099     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2355754     Document Type: Conference Paper

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