Comparison of yeast inactivation treated in he, air and N2 DBD plasma

Plasma Science and Technology

Volumn 8, Issue 6, 2006, Pages 720-723

  Jin, Ying ^a   Ren, Chunsheng ^a   Xiu, Zhilong ^a   Wang, Dezhen ^a   Wang, Younian ^a   Yu, Hong ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Dielectric barrier discharge; Electrostatic tension; Inactivation; pH; Yeast

Indexed keywords

ATMOSPHERIC PRESSURE; CELL CULTURE; ELECTRIC DISCHARGES; HELIUM; MORPHOLOGY; NITROGEN; PH; SCANNING ELECTRON MICROSCOPY; YEAST;

DIELECTRIC BARRIER DISCHARGE; ELECTROSTATIC TENSION; GERMICIDAL EFFICIENCY; YEAST INACTIVATION;

PLASMAS;

EID: 33846855142     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/8/6/21     Document Type: Article

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