The reactivity in the system CuCl-Si related to the activation of silicon in the Direct Synthesis

Silicon Chemistry

Volumn 2, Issue 3-4, 2003, Pages 195-206

  Acker, J ^a   Kother S ^b   Lewis, K M ^c   Bohmhammel, K ^b  

^a IFW DRESDEN   (Germany)

^b TU BERGAKADEMIE FREIBERG   (Germany)

^c OSi Specialties Inc   (United States)

Author keywords

Calorimetry; Copper silicide; Cuprous chloride; Defect concentration; Direct process; Heat capacity; Reactivity; Solid state reaction

Indexed keywords

EID: 33846848012     PISSN: 15690660     EISSN: 15728994     Source Type: Journal    
DOI: 10.1023/B:SILC.0000046751.05300.d4     Document Type: Conference Paper

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