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Volumn 1, Issue 10, 2006, Pages 137-141

Scale-up of the barium titanate atomic layer deposition process onto 200 mm wafer

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; CRYSTALLIZATION; DEPOSITION; SILICON WAFERS; STOICHIOMETRY; TITANIUM COMPOUNDS;

EID: 33846787138     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2209339     Document Type: Conference Paper
Times cited : (11)

References (3)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.