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Volumn 1, Issue 10, 2006, Pages 137-141
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Scale-up of the barium titanate atomic layer deposition process onto 200 mm wafer
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTALLINE MATERIALS;
CRYSTALLIZATION;
DEPOSITION;
SILICON WAFERS;
STOICHIOMETRY;
TITANIUM COMPOUNDS;
CYCLE RATIOS;
THERMAL ANNEALING;
TITANIUM METHOXIDE;
BARIUM TITANATE;
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EID: 33846787138
PISSN: 19385862
EISSN: 19386737
Source Type: Conference Proceeding
DOI: 10.1149/1.2209339 Document Type: Conference Paper |
Times cited : (11)
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References (3)
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