Multi-layer resist system for 45nm-node and beyond (III)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Abe, Yuuki ^a   Morimoto, Jumpei ^a   Yokoyama, Toshifumi ^a   Kominato, Atsushi ^b   Ohkubo, Yasushi ^b  

^a DAI NIPPON PRINTING CO LTD   (Japan)

^b Blanks Division   (Japan)

Author keywords

45nm node; Dry etch; Hard mask; Multi layer resist

Indexed keywords

CHIP SCALE PACKAGES; DRY ETCHING; MASKS; MULTILAYERS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY;

HARD MASKS; MULTILAYER RESISTS; PROXIMITY PROCESS ERROR; RESOLUTION ENHANCEMENT;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 33846588005     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.692889     Document Type: Conference Paper

References (2)

1. M. Hashimoto, et al, "Multi-layer resist system for 45nm-node and beyond (I) " Proceedings of the SPIE, Vol.6389, 2006
2. Sung-Won kwon, et al, "photomask dry-etching techniques for hard mask" Proceedings of the SPIE, Vol.6283, 2006