High Q factor for mechanical resonances of batch-fabricated SiC nanowires

Applied Physics Letters

Volumn 90, Issue 4, 2007, Pages

  Perisanu, S ^a   Vincent, P ^a   Ayari, A ^a   Choueib, M ^a   Purcell, S T ^a   Bechelany, M ^b   Cornu, D ^b  

^a UNIVERSITÉ LYON 1   (France)

^b UNIVERSITÉ CLAUDE BERNARD LYON 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE ELEMENT METHOD; IMAGE QUALITY; Q FACTOR MEASUREMENT; SILICON CARBIDE; ULTRAHIGH VACUUM; VIBRATIONS (MECHANICAL);

HIGH TEMPERATURE IN SITU CLEANING; IMAGE BLURRING; MECHANICAL RESONANCES; NANOWIRES;

NANOSTRUCTURED MATERIALS;

EID: 33846573387     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2432257     Document Type: Article

References (11)

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