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Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 4813-4816
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Concept, techniques, deposition mechanism of impulse plasma deposition - A short review
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Author keywords
PA PVD CVD; Plasma surface engineering; Thin films
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Indexed keywords
NANOSTRUCTURED MATERIALS;
NUCLEATION;
PLASMAS;
THIN FILMS;
TITANIUM NITRIDE;
IMPULSE PLASMA DEPOSITION;
PLASMA SURFACE ENGINEERING;
VAPOR DEPOSITION;
NANOSTRUCTURED MATERIALS;
NUCLEATION;
PLASMAS;
THIN FILMS;
TITANIUM NITRIDE;
VAPOR DEPOSITION;
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EID: 33846552286
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2006.07.024 Document Type: Article |
Times cited : (42)
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References (33)
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