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Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 4813-4816

Concept, techniques, deposition mechanism of impulse plasma deposition - A short review

Author keywords

PA PVD CVD; Plasma surface engineering; Thin films

Indexed keywords

NANOSTRUCTURED MATERIALS; NUCLEATION; PLASMAS; THIN FILMS; TITANIUM NITRIDE;

EID: 33846552286     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.07.024     Document Type: Article
Times cited : (42)

References (33)
  • 7
  • 16
    • 33846533303 scopus 로고    scopus 로고
    • B. Gokieli, Doctoral Thesis, Institute of Materials Science, Warsaw University of Technology, 1980 (in Polish).
  • 27


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.