Impulse plasma deposition of aluminum oxide layers for Al2O3/Si, SiC, GaN systems

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 170-175

  Werbowy, A ^a   Zdunek, K ^a   Dusinski E ^a   Szmidt, J ^a   Elert, M ^a  

^a WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Aluminum oxide; Impulse plasma deposition; Stoichiometry

Indexed keywords

COMPOSITION; INTERFACES (MATERIALS); MICROELECTRONICS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY;

BANDGAP MATERIALS;

ALUMINA;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0043194088     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00527-9     Document Type: Article

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