SCOPUS 정보 검색 플랫폼

Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 5081-5084

Selective etching in LiNbO3 combined of MeV O and Si ion implantation with wet-etch technique

Author keywords

Etching; Ion implantation; LiNbO3

Indexed keywords

ETCHING; ION IMPLANTATION; MORPHOLOGY; PHOTORESISTS; PROFILOMETRY;

RIDGE STRUCTURES; RIDGE WAVEGUIDES; WET ETCHING;

LITHIUM NIOBATE;

ETCHING; ION IMPLANTATION; LITHIUM NIOBATE; MORPHOLOGY; PHOTORESISTS; PROFILOMETRY;

EID: 33846471597 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2006.07.145 Document Type: Article

Times cited : (17)

References (14)

1
- 0022104048
- Buchmann P., and Kaufmann H. J. Lightwave Technol. 3 (1985) 785
- (1985) J. Lightwave Technol. , vol.3 , pp. 785
- Buchmann, P.¹ Kaufmann, H.²

2
- 0026678412
- Johnson J.E., and Tang C.L. IEEE Photonics Technol. Lett. 4 (1992) 24
- (1992) IEEE Photonics Technol. Lett. , vol.4 , pp. 24
- Johnson, J.E.¹ Tang, C.L.²

3
- 0032595043
- Manolatou C., Johnson S.G., Fan S., Villeneuve P.R., Haus H.A., and Joannopoulos J.D. J. Lightwave Technol. 17 (1999) 1682
- (1999) J. Lightwave Technol. , vol.17 , pp. 1682
- Manolatou, C.¹ Johnson, S.G.² Fan, S.³ Villeneuve, P.R.⁴ Haus, H.A.⁵ Joannopoulos, J.D.⁶

4
- 6144246938
- Mekis A., Chen J.C., Kurland I., Fan S., Villeneuve P.R., and Joannopoulos J.D. Phys. Rev. Lett. 77 (1996) 3787
- (1996) Phys. Rev. Lett. , vol.77 , pp. 3787
- Mekis, A.¹ Chen, J.C.² Kurland, I.³ Fan, S.⁴ Villeneuve, P.R.⁵ Joannopoulos, J.D.⁶

5
- 0022110727
- Weis R.S., and Gaylord T.K. Appl. Phys., A 37 (1985) 191
- (1985) Appl. Phys., A , vol.37 , pp. 191
- Weis, R.S.¹ Gaylord, T.K.²

6
- 0003631701
- Cambridge University Press
- Townsend P.D., Chandler P.J., and Zhang L. Optical Effects of Ion Implantation (1994), Cambridge University Press
- (1994) Optical Effects of Ion Implantation
- Townsend, P.D.¹ Chandler, P.J.² Zhang, L.³

7
- 4944236307
- Wang X.L., Chen F., Wang K.M., Lu Q.M., Shen D.Y., and Nie R. Appl. Phys. Lett. 85 (2005) 1457
- (2005) Appl. Phys. Lett. , vol.85 , pp. 1457
- Wang, X.L.¹ Chen, F.² Wang, K.M.³ Lu, Q.M.⁴ Shen, D.Y.⁵ Nie, R.⁶

8
- 85047684597
- Banyasz I., Fried M., Ducso Cs., and Vertesy Z. Appl. Phys. Lett. 79 (2001) 3755
- (2001) Appl. Phys. Lett. , vol.79 , pp. 3755
- Banyasz, I.¹ Fried, M.² Ducso, Cs.³ Vertesy, Z.⁴

9
- 0141982037
- Lee C.L., and Liu C.L. Appl. Phys. Lett. 35 (1979) 756
- (1979) Appl. Phys. Lett. , vol.35 , pp. 756
- Lee, C.L.¹ Liu, C.L.²

10
- 5844319383
- Ohmachi Y., and Noda J. Appl. Phys. Lett. 27 (1975) 544
- (1975) Appl. Phys. Lett. , vol.27 , pp. 544
- Ohmachi, Y.¹ Noda, J.²

11
- 0009227925
- Jackel J.L., Howard R.E., Hu E.L., and Lyman S.P. Appl. Phys. Lett. 38 (1981) 907
- (1981) Appl. Phys. Lett. , vol.38 , pp. 907
- Jackel, J.L.¹ Howard, R.E.² Hu, E.L.³ Lyman, S.P.⁴

12
- 0026946989
- Laurell F., Webjörn J., Arvidsson G., and Holmberg J. J. Lightwave Technol. 10 (1992) 1606
- (1992) J. Lightwave Technol. , vol.10 , pp. 1606
- Laurell, F.¹ Webjörn, J.² Arvidsson, G.³ Holmberg, J.⁴

13
- 0038680601
- Crunteanu A., Janchen G., Hoffmann P., Pollnau M., Buchal C., Petraru A., Eason R.W., and Shepherd D.P. Appl. Phys., A 76 (2003) 1109
- (2003) Appl. Phys., A , vol.76 , pp. 1109
- Crunteanu, A.¹ Janchen, G.² Hoffmann, P.³ Pollnau, M.⁴ Buchal, C.⁵ Petraru, A.⁶ Eason, R.W.⁷ Shepherd, D.P.⁸

14
- 2142831630
- Ashby C.I.H., Arnold G.W., and Brannon P.J. J. Appl. Phys. 65 (1989) 93
- (1989) J. Appl. Phys. , vol.65 , pp. 93
- Ashby, C.I.H.¹ Arnold, G.W.² Brannon, P.J.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.