Investigation on 4-body finishing technology with polishing paste

Key Engineering Materials

Volumn 329, Issue , 2007, Pages 267-272

  Zhou, Wenjun ^a   Tani, Yasuhiro ^a  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

Abrasive; Base agent; Chip; Dispersion medium; Dispersion stability; Media particle; Paste; Polishing; Polymer particle; Scratch; Spacer; Viscosity

Indexed keywords

ABRASIVES; DISPERSIONS; POLYMERS; VISCOSITY;

BASE AGENTS; DISPERSION MEDIUM; DISPERSION STABILITY; MEDIA PARTICLES; POLYMER PARTICLES; SCRATCH; SPACERS;

POLISHING;

EID: 33846378926     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/0-87849-416-2.267     Document Type: Article

References (4)

1. Y. Lu, Y. Tani and K. Kawata: Proposal of New Polishing Technology without Using a Polishing Pad, Annals of the CIRP, Vol. 51/1/ 2002, pp. 262-267.
2. W. Zhou, Y. Tani and K. Kawata: Application of Polymer Particle Assisited Polishing with Oil Dispersion Slurries, 6th International Conference on Progress of Machinging Technology. (2002), pp. 369-374.
3. W. Zhou, Y. Tani and K. Kawata: Proposal of 5-Body Finishing Technology for Long Tool Life-Polymer Particle Assisted Polishing Using Oil Dispersion Slurries with Metallic Soap Particles), 7th International Conference on Progress of Machinging Technology, (2004), pp. 369-374.
4. H. Yosizawa and H. Eta: Slurries and Pastes for Ultra-precision Finishing Process. Japanese Patent publication No2003-156239, Publication date: Juin 22, 1993.