Growth of Ni-Al alloys on Ni(1 1 1), from Al deposits of various thicknesses: (II) Formation of NiAl over a Ni3Al interfacial layer

Surface Science

Volumn 601, Issue 2, 2007, Pages 395-410

  Le Pevedic S ^a   Schmaus, D ^a   Cohen, C ^a  

^a INSTITUT DES NANOSCIENCES DE PARIS   (France)

Author keywords

Alloys; Aluminum; Atomic force microscopy (AFM); Auger electron spectroscopy (AES); Diffusion; Epitaxy; Growth; Ion channeling; Low energy electron diffraction (LEED); Nickel; Nuclear resonance profiling (NRP); Rutherford backscattering spectrometry (RBS); X ray diffraction (XRD)

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; DEPOSITION; DIFFUSION; EPITAXIAL GROWTH; LOW ENERGY ELECTRON DIFFRACTION; NICKEL ALLOYS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY DIFFRACTION;

EPITAXIAL RELATIONSHIP; HETEROGENEOUS GROWTH; ION CHANNELING; NUCLEAR RESONANCE PROFILING (NRP);

THIN FILMS;

EID: 33846122628     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.10.005     Document Type: Article

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