The reaction between silylene and ammonia: Some gas-phase kinetic and quantum chemical studies

Silicon Chemistry

Volumn 3, Issue 3-4, 2007, Pages 131-138

  Becerra, Rosa ^a   Cannady, Pat J ^b   Walsh, Robin ^c  

^a INSTITUTO DE QUÍMICA FÍSICA ROCASOLANO   (Spain)

^b DOW CORNING CORPORATION   (United States)

^c UNIVERSITY OF READING   (United Kingdom)

Author keywords

Ab initio calculations; Amino radical; Ammonia; Kinetics; Laser flash photolysis; Silylene

Indexed keywords

EID: 33845933674     PISSN: 15690660     EISSN: 15728994     Source Type: Journal    
DOI: 10.1007/s11201-006-9018-3     Document Type: Article

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