Time-resolved gas-phase kinetic and quantum chemical studies of the reaction of silylene with nitric oxide

Journal of Physical Chemistry A

Volumn 109, Issue 6, 2005, Pages 1071-1080

  Becerra, Rosa ^a   Bowes, Sarah Jane ^b   Ogden, J Steven ^b   Cannady, J Pat ^c   Almond, Matthew J ^d   Walsh, Robin ^d  

^a INSTITUTO DE QUÍMICA FÍSICA ROCASOLANO   (Spain)

^b UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^c DOW CORNING CORPORATION   (United States)

^d UNIVERSITY OF READING   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON MOLECULES; PHOTOCHEMICAL BREAKDOWN; PRESSURE DEPENDENCE; SILYLENES;

CHEMICAL VAPOR DEPOSITION; DISSOCIATION; ISOMERIZATION; LASER APPLICATIONS; PHOTOCHEMICAL REACTIONS; PHOTOLYSIS; RATE CONSTANTS; REACTION KINETICS;

ORGANIC COMPOUNDS;

EID: 14544293477     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp045600p     Document Type: Article

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