In situ synthesis of Si3N4 from Na2SiF6 as a silicon solid precursor

Materials Chemistry and Physics

Volumn 98, Issue 1, 2006, Pages 27-33

  Leal Cruz, A L ^a   Pech Canul, M I ^a  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

Chemical vapor deposition (CVD); Coatings; Nitrides

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; NITRIDES; SYNTHESIS (CHEMICAL);

IN SITU PROCESSES; SOLID PRECURSOR; WHISKERS;

SILICON COMPOUNDS;

EID: 33646108838     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2005.08.057     Document Type: Article

References (16)

1. Lee W.E., and Rainforth W.M. Ceramic Microstructures, Property Control by Processing (1994), Chapman & Hall, New York p. 389
2. Vila M., Prieto C., Miranzo P., Osendi M.I., and Ramirez R. Surface Coat. Technol. 151-152 (2002) 67
3. Somiya S., Mitomo M., and Yoshimura M. Silicon Nitride-1 (1989), Elsevier Applied Science, New York p. 39
4. Kingon A.I., Lutz J.L., and Davis R.F. J. Am. Ceram. Soc. 66 8 (1983) 551
5. Cano I.G., and Rodríguez M.A. Scripta Mater. 50 (2004) 383
6. Cao Y.G., Chen H., Li J.T., Ge C.C., Tang S.Y., Tang J.X., and Chen X. J. Cryst. Growth 234 (2002) 9
7. Kashiwaya Y., and Cramb A.W. Metal. Mater. Trans. B 33B (2002) 129
8. Lee W.Y., Strife J.R., and Veltri R.D. J. Am. Ceram. Soc. 75 8 (1992) 2200
9. 6 in nitrogen containing atmosphere, M.Sc. thesis, Cinvestav Saltillo. Saltillo Coah., México, 2004.
10. Roy R.K. A Primer on the Taguchi Method (1990), Society of Manufacturing Engineers, Deaborn MI p. 40
11. R.C. Weast, C.R.C Handbook of Chemistry and Physics, 51 ed., The Chemical Rubber Co., Cleveland Ohio, 1970, p. E-80.
12. Ibid, F-158.
13. U. Kuntz, US Patent no. 3 226 194, (1965).
14. Galasso F., Kuntz U., and Croft W.J. J. Am. Ceram. Soc. 55 8 (1972) 431
15. Galasso F.S., Veltri R.D., and Croft W.J. Am. Ceram. Soc. Bull. 57 4 (1978) 453
16. Larson R.S. J. Am. Ceram. Soc. 76 8 (1993) 1930