High reflectivity high- Q micromechanical Bragg mirror

Applied Physics Letters

Volumn 89, Issue 22, 2006, Pages

  Bohm H R ^b   Gigan, S ^a   Blaser, F ^b   Zeilinger, A ^b   Aspelmeyer, M ^a   Langer, G ^c   Bauerle D ^c,f   Hertzberg, J B ^d   Schwab, K C ^e,g  

^a UNIVERSITY OF VIENNA   (Austria)

^b ERICH SCHMID INSTITUTE OF MATERIALS SCIENCE   (Austria)

^c JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^d Bldg 142   (United States)

^e LABORATORY FOR PHYSICAL SCIENCES   (United States)

^f UNIVERSITY OF CALIFORNIA   (United States)

^g Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROMECHANICAL BRAGG MIRROR; MICROMECHANICAL OSCILLATORS; QUALITY FACTOR;

ETCHING; LASER ABLATION; LIGHT REFLECTION; OSCILLATORS (ELECTRONIC);

MIRRORS;

EID: 33751556187     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2393000     Document Type: Article

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