Optical transitions of Cu2O nanocrystals in SiO2 fabricated by ion implantation and two-step annealing

Applied Physics Letters

Volumn 89, Issue 22, 2006, Pages

  Amekura, H ^a   Umeda, N ^a   Takeda, Y ^a   Kishimoto, N ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ION IMPLANTATION; SILICA; SURFACE PLASMON RESONANCE;

ABSORPTION PEAKS; OPTICAL TRANSITIONS; PEAK WIDTH;

NANOSTRUCTURED MATERIALS;

EID: 33751555268     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2399343     Document Type: Article

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