-
1
-
-
0029954636
-
Characteristic aspects of formation of new particles during the growth of monosize silica seeds
-
Chen S.L., Dong P., Yang G.H., Yang J.J. (1996). Characteristic aspects of formation of new particles during the growth of monosize silica seeds. Journal of colloidal and interface science 180:237-241
-
(1996)
J. Colloidal Inter. Sci.
, vol.180
, pp. 237-241
-
-
Chen, S.L.1
Dong, P.2
Yang, G.H.3
Yang, J.J.4
-
2
-
-
33751536068
-
Decines, production of silica colloids
-
U.S. Patent 5066420
-
Chevallier Y., 1991. Decines, Production of silica colloids, U.S. Patent 5066420
-
(1991)
-
-
Chevallier, Y.1
-
3
-
-
33751507708
-
Decines, conductive ceramic sintered body
-
U.S. Patent 5236623
-
Chevallier Y., 1993. Decines, Conductive ceramic sintered body, U.S. Patent 5236623
-
(1993)
-
-
Chevallier, Y.1
-
4
-
-
0000452851
-
Synthesis and growth of colloidal silica particles
-
Coenen S., Kruif C.G.De. (1988). Synthesis and growth of colloidal silica particles. Journal of Colloidal and Interface Science 124:104-110
-
(1988)
J. Colloidal Inter. Sci.
, vol.124
, pp. 104-110
-
-
Coenen, S.1
Kruif, C.G.De.2
-
5
-
-
33751545557
-
Polishing composition including an inhibitor of tungsten etching
-
U.S. Patent 6136711
-
Grumbine S.K., C.C. Streinz & E.W.G. Hoglund, 1998. Polishing composition including an inhibitor of tungsten etching, U.S. Patent 6136711
-
(1998)
-
-
Grumbine, S.K.1
Streinz, C.C.2
Hoglund, E.W.G.3
-
6
-
-
33751518393
-
Highly tintable abrasion resistant coatings
-
U.S. Patent 5013608
-
Guest A.M., M.W. Preus & W. Lewis, 1989. Highly tintable abrasion resistant coatings, U.S. Patent 5013608
-
(1989)
-
-
Guest, A.M.1
Preus, M.W.2
Lewis, W.3
-
7
-
-
33751518393
-
Highly tintable abrasion resistant coatings
-
U.S. Patent 5102695
-
Guest A.M., M.W. Preus & W. Lewis, 1990. Highly tintable abrasion resistant coatings, U.S. Patent 5102695
-
(1990)
-
-
Guest, A.M.1
Preus, M.W.2
Lewis, W.3
-
8
-
-
33751530284
-
Polishing composition and polishing method employing it
-
U.S. Patent 6139763
-
Ina K., T. Kitamura, T. Kamiya & S. Suzumura, 2000. Polishing composition and polishing method employing it, U.S. Patent 6139763
-
(2000)
-
-
Ina, K.1
Kitamura, T.2
Kamiya, T.3
Suzumura, S.4
-
9
-
-
33751533728
-
Process for the production of paper
-
U.S. Patent 4964954
-
Johansson H., 1990. Process for the production of paper, U.S. Patent 4964954
-
(1990)
-
-
Johansson, H.1
-
10
-
-
33751513342
-
Process of making stable silica sols and resulting composition
-
U.S. Patent 2577485
-
Joseph, M. R. & O. Cleveland, 1951. Process of making stable silica sols and resulting composition, U.S. Patent 2577485
-
(1951)
-
-
Joseph, M.R.1
Cleveland, O.2
-
12
-
-
33751522846
-
Process for preparing stable positively charged alumina coated silica sols and product thereof
-
U.S. Patent 3956171
-
Moore E.P., 1976. Process for preparing stable positively charged alumina coated silica sols and product thereof, U.S. Patent 3956171
-
(1976)
-
-
Moore, E.P.1
-
13
-
-
33751510407
-
Process for preparing a UV-curable coating material and anti-abrasion coating composition
-
U.S. Patent 5635544
-
M. Tamura & H. Fukushima, 1997. Process for preparing a UV-curable coating material and anti-abrasion coating composition, U.S. Patent 5635544
-
(1997)
-
-
Tamura, M.1
Fukushima, H.2
-
14
-
-
20444406055
-
Controlled growth of monodispersed silica spheres in the micron size range
-
Stöber W., Rang A. (1968). Controlled growth of monodispersed silica spheres in the micron size range. Journal of colloidal and interface science 26:62-69
-
(1968)
J. Colloidal Inter. Sci.
, vol.26
, pp. 62-69
-
-
Stöber, W.1
Rang, A.2
-
15
-
-
33751540129
-
Radiation curable coating composition based on a silica/vinyl-functional silanol dispersion
-
U.S. Patent 4822828
-
Swofford H.W., 1989. Radiation curable coating composition based on a silica/vinyl-functional silanol dispersion, U.S. Patent 4822828
-
(1989)
-
-
Swofford, H.W.1
-
16
-
-
0141956001
-
Surface modification of nano colloidal silica for use as polishing abrasive particles
-
Tsai M.S. (2003). Surface modification of nano colloidal silica for use as polishing abrasive particles. Materials Science and Engineering B104:63-67
-
(2003)
Mat. Sci. Eng. B
, vol.104
, pp. 63-67
-
-
Tsai, M.S.1
-
17
-
-
0344014318
-
The study of formation colloidal silica via sodium silicate
-
Tsai M.S. (2004). The study of formation colloidal silica via sodium silicate. Materials Science and Engineering B 106:52-55
-
(2004)
Materials Science and Engineering B
, vol.106
, pp. 52-55
-
-
Tsai, M.S.1
-
18
-
-
1642632952
-
Aluminum modified colloidal silica via sodium silicate
-
Tsai M.S., Wu W.C. (2004). Aluminum modified colloidal silica via sodium silicate. Materials Letters 58:1881-1884
-
(2004)
Mat. Lett.
, vol.58
, pp. 1881-1884
-
-
Tsai, M.S.1
Wu, W.C.2
-
19
-
-
22644447417
-
The study of formation process of colloidal silica
-
Tsai M.S., Huang P.Y. (2005). The study of formation process of colloidal silica. Material Research Bulletin 40:1609-1616
-
(2005)
Mat. Res. Bull.
, vol.40
, pp. 1609-1616
-
-
Tsai, M.S.1
Huang, P.Y.2
-
20
-
-
33751550219
-
Method of preparing high-purity aqueous silica sol
-
U.S. Patent 5100581
-
Watanabe Y. and H. Suzuki, 1992. Method of preparing high-purity aqueous silica sol, U.S. Patent 5100581
-
(1992)
-
-
Watanabe, Y.1
Suzuki, H.2
-
21
-
-
0039071684
-
Silica nucleation, polymerization, and growth preparation of monodispersed sol
-
The colloidal chemical of silica Oxford University Press, Oxford
-
Yoshida A., 1994. Silica nucleation, polymerization, and growth preparation of monodispersed sol, The colloidal chemical of silica, Advance in chemistry series 234, Oxford University Press, Oxford, pp. 51-62
-
(1994)
Advance in Chemistry Series
, vol.234
, pp. 51-62
-
-
Yoshida, A.1
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