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Volumn 8, Issue 6, 2006, Pages 943-949

Formation mechanisms of colloidal silica via sodium silicate

Author keywords

Colloidal silica; Colloids; Nanoparticle; Slurry

Indexed keywords

AGGLOMERATION; COLLOIDS; CONCENTRATION (PROCESS); HEAT TREATMENT; NUCLEATION; SLURRIES; SURFACE CHEMISTRY;

EID: 33751514900     PISSN: 13880764     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11051-005-9047-4     Document Type: Article
Times cited : (15)

References (21)
  • 1
    • 0029954636 scopus 로고    scopus 로고
    • Characteristic aspects of formation of new particles during the growth of monosize silica seeds
    • Chen S.L., Dong P., Yang G.H., Yang J.J. (1996). Characteristic aspects of formation of new particles during the growth of monosize silica seeds. Journal of colloidal and interface science 180:237-241
    • (1996) J. Colloidal Inter. Sci. , vol.180 , pp. 237-241
    • Chen, S.L.1    Dong, P.2    Yang, G.H.3    Yang, J.J.4
  • 2
    • 33751536068 scopus 로고
    • Decines, production of silica colloids
    • U.S. Patent 5066420
    • Chevallier Y., 1991. Decines, Production of silica colloids, U.S. Patent 5066420
    • (1991)
    • Chevallier, Y.1
  • 3
    • 33751507708 scopus 로고
    • Decines, conductive ceramic sintered body
    • U.S. Patent 5236623
    • Chevallier Y., 1993. Decines, Conductive ceramic sintered body, U.S. Patent 5236623
    • (1993)
    • Chevallier, Y.1
  • 4
    • 0000452851 scopus 로고
    • Synthesis and growth of colloidal silica particles
    • Coenen S., Kruif C.G.De. (1988). Synthesis and growth of colloidal silica particles. Journal of Colloidal and Interface Science 124:104-110
    • (1988) J. Colloidal Inter. Sci. , vol.124 , pp. 104-110
    • Coenen, S.1    Kruif, C.G.De.2
  • 5
    • 33751545557 scopus 로고    scopus 로고
    • Polishing composition including an inhibitor of tungsten etching
    • U.S. Patent 6136711
    • Grumbine S.K., C.C. Streinz & E.W.G. Hoglund, 1998. Polishing composition including an inhibitor of tungsten etching, U.S. Patent 6136711
    • (1998)
    • Grumbine, S.K.1    Streinz, C.C.2    Hoglund, E.W.G.3
  • 6
    • 33751518393 scopus 로고
    • Highly tintable abrasion resistant coatings
    • U.S. Patent 5013608
    • Guest A.M., M.W. Preus & W. Lewis, 1989. Highly tintable abrasion resistant coatings, U.S. Patent 5013608
    • (1989)
    • Guest, A.M.1    Preus, M.W.2    Lewis, W.3
  • 7
    • 33751518393 scopus 로고
    • Highly tintable abrasion resistant coatings
    • U.S. Patent 5102695
    • Guest A.M., M.W. Preus & W. Lewis, 1990. Highly tintable abrasion resistant coatings, U.S. Patent 5102695
    • (1990)
    • Guest, A.M.1    Preus, M.W.2    Lewis, W.3
  • 8
    • 33751530284 scopus 로고    scopus 로고
    • Polishing composition and polishing method employing it
    • U.S. Patent 6139763
    • Ina K., T. Kitamura, T. Kamiya & S. Suzumura, 2000. Polishing composition and polishing method employing it, U.S. Patent 6139763
    • (2000)
    • Ina, K.1    Kitamura, T.2    Kamiya, T.3    Suzumura, S.4
  • 9
    • 33751533728 scopus 로고
    • Process for the production of paper
    • U.S. Patent 4964954
    • Johansson H., 1990. Process for the production of paper, U.S. Patent 4964954
    • (1990)
    • Johansson, H.1
  • 10
    • 33751513342 scopus 로고
    • Process of making stable silica sols and resulting composition
    • U.S. Patent 2577485
    • Joseph, M. R. & O. Cleveland, 1951. Process of making stable silica sols and resulting composition, U.S. Patent 2577485
    • (1951)
    • Joseph, M.R.1    Cleveland, O.2
  • 12
    • 33751522846 scopus 로고
    • Process for preparing stable positively charged alumina coated silica sols and product thereof
    • U.S. Patent 3956171
    • Moore E.P., 1976. Process for preparing stable positively charged alumina coated silica sols and product thereof, U.S. Patent 3956171
    • (1976)
    • Moore, E.P.1
  • 13
    • 33751510407 scopus 로고    scopus 로고
    • Process for preparing a UV-curable coating material and anti-abrasion coating composition
    • U.S. Patent 5635544
    • M. Tamura & H. Fukushima, 1997. Process for preparing a UV-curable coating material and anti-abrasion coating composition, U.S. Patent 5635544
    • (1997)
    • Tamura, M.1    Fukushima, H.2
  • 14
    • 20444406055 scopus 로고
    • Controlled growth of monodispersed silica spheres in the micron size range
    • Stöber W., Rang A. (1968). Controlled growth of monodispersed silica spheres in the micron size range. Journal of colloidal and interface science 26:62-69
    • (1968) J. Colloidal Inter. Sci. , vol.26 , pp. 62-69
    • Stöber, W.1    Rang, A.2
  • 15
    • 33751540129 scopus 로고
    • Radiation curable coating composition based on a silica/vinyl-functional silanol dispersion
    • U.S. Patent 4822828
    • Swofford H.W., 1989. Radiation curable coating composition based on a silica/vinyl-functional silanol dispersion, U.S. Patent 4822828
    • (1989)
    • Swofford, H.W.1
  • 16
    • 0141956001 scopus 로고    scopus 로고
    • Surface modification of nano colloidal silica for use as polishing abrasive particles
    • Tsai M.S. (2003). Surface modification of nano colloidal silica for use as polishing abrasive particles. Materials Science and Engineering B104:63-67
    • (2003) Mat. Sci. Eng. B , vol.104 , pp. 63-67
    • Tsai, M.S.1
  • 17
    • 0344014318 scopus 로고    scopus 로고
    • The study of formation colloidal silica via sodium silicate
    • Tsai M.S. (2004). The study of formation colloidal silica via sodium silicate. Materials Science and Engineering B 106:52-55
    • (2004) Materials Science and Engineering B , vol.106 , pp. 52-55
    • Tsai, M.S.1
  • 18
    • 1642632952 scopus 로고    scopus 로고
    • Aluminum modified colloidal silica via sodium silicate
    • Tsai M.S., Wu W.C. (2004). Aluminum modified colloidal silica via sodium silicate. Materials Letters 58:1881-1884
    • (2004) Mat. Lett. , vol.58 , pp. 1881-1884
    • Tsai, M.S.1    Wu, W.C.2
  • 19
    • 22644447417 scopus 로고    scopus 로고
    • The study of formation process of colloidal silica
    • Tsai M.S., Huang P.Y. (2005). The study of formation process of colloidal silica. Material Research Bulletin 40:1609-1616
    • (2005) Mat. Res. Bull. , vol.40 , pp. 1609-1616
    • Tsai, M.S.1    Huang, P.Y.2
  • 20
    • 33751550219 scopus 로고
    • Method of preparing high-purity aqueous silica sol
    • U.S. Patent 5100581
    • Watanabe Y. and H. Suzuki, 1992. Method of preparing high-purity aqueous silica sol, U.S. Patent 5100581
    • (1992)
    • Watanabe, Y.1    Suzuki, H.2
  • 21
    • 0039071684 scopus 로고
    • Silica nucleation, polymerization, and growth preparation of monodispersed sol
    • The colloidal chemical of silica Oxford University Press, Oxford
    • Yoshida A., 1994. Silica nucleation, polymerization, and growth preparation of monodispersed sol, The colloidal chemical of silica, Advance in chemistry series 234, Oxford University Press, Oxford, pp. 51-62
    • (1994) Advance in Chemistry Series , vol.234 , pp. 51-62
    • Yoshida, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.