The study of formation colloidal silica via sodium silicate

Materials Science and Engineering: B

Volumn 106, Issue 1, 2004, Pages 52-55

  Tsai, Ming Shyong ^a  

^a SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Colloidal silica; Particle formation; Sodium silica

Indexed keywords

CHEMICAL MECHANICAL POLISHING; COLLOIDS; HYDROLYSIS; ION EXCHANGE; PARTICLE SIZE ANALYSIS; SOLUTIONS; SYNTHESIS (CHEMICAL); TITRATION;

PEPTIZATION;

SILICA;

EID: 0344014318     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2003.08.052     Document Type: Article

References (18)

1. A. Yoshida, The Colloidal Chemical Of Silica, Advance In Chemistry Series 234, Oxford University Press, Oxford, 1994, pp. 51-62.
2. Stöber W., Rang A. J. Colloid. Interface Sci. 26:1968;62-69.
3. Chen S.L., Dong P., Yang G.H., Yang J.J. J. Colloid. Interface Sci. 180:1966;237-241.
4. Coenen S., Kruif C.G.De. J. Colloid. Interface Sci. 124:1988;104-110.
5. E.P. Moore, US Patent 3956171.
6. J.M. Rule, et al., US Patent 2577485.
7. Y. Watanabe, H. Suzuki, US Patent 5100581.
8. Y. Chevallier, Decines, US Patent 5066423.
9. Yvonick Chevallier, Decines, US Patent 5066420.
10. Lee Y.K., Yoon Y.R., Rhee H.K. Colloids Surf. 173:2000;109-116.
11. H. Johansson, US Patent 4964954 (1990).
12. H.W. Swofford, US Patent 4822828 (1987).
13. A.M. Guest, et al. US Patent 5013608 (1989).
14. A.M. Guest, et al., US Patent 5102695 (1990).
15. M. Tamura, et al., US Patent 5635544 (1995).
16. S.K. Grumbine, et al., US Patent 6136711 (1998).
17. I. Katsuyoshi, et al., US Patent 6139763 (1999).
18. Lin C.F., et al. Thin solid films. 347:1999;248-252.