Film growth and interface reaction of ultra thin 3d-transition metal oxide/metal layer structures

Microchimica Acta

Volumn 156, Issue 1-2, 2006, Pages 27-31

  Nagel, Mathias ^a   Zhang, Lei ^a   Peisert, Heiko ^a   Chassé, Thomas ^a  

^a UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

Film growth; Interface reaction; Transition metal oxide; Ultra thin film; XPS (x ray photoelectron spectroscopy)

Indexed keywords

EID: 33751440361     PISSN: 00263672     EISSN: 14365073     Source Type: Journal    
DOI: 10.1007/s00604-006-0599-5     Document Type: Conference Paper

References (12)

1. P Grünberg 2001 Phys Today 54 31
2. D H Han J G Zhu J H Judy 1997 J Appl Phys 81 4996
3. M Finazzi S Altieri 2003 Phys Rev B 68 054420
4. A K Santra D W Goodman 2002 J Phys: Condens Matter 14 R31
5. S Altieri L H Tjeng G A Sawatzky 2001 Thin Solid Films 400 9
6. T J Regan H Ohldag C Stamm F Nolting J Lüning J Stöhr R L White 2001 Phys Rev B 64 214422
7. R de Masi D Reinicke F Müller P Steiner S Hüfner 2002 Surf Sci 515 523
8. S A Krasnikov A B Preobrajenski T Chassé R Szargan 2003 Thin Solid Films 428 201
9. S Benedetti P Luches M Liberati S Valeri 2004 Surf Sci 572 L348
10. C Mocuta A Barbier G Renaud M Panabière P Bayle-Guillemaud 2004 J Appl Phys 95 2151
11. V Di Castro G Polzonetti 1989 J Electron Spectrosc Relat Phenom 48 117
12. th edn. CRC Press, Florida