Fabrication of La0.85Na0.15Mn1-xNixO3 (x = 0, 0.05, 0.1) thin films on Si substrates via chemical solution deposition

Physica B: Condensed Matter

Volumn 387, Issue 1-2, 2007, Pages 77-80

  Liu, S M ^a,b   Zhu, X B ^b   Gao, B ^a   Sun, Y P ^b  

^a ZHONGYUAN UNIVERSITY OF TECHNOLOGY   (China)

^b INSTITUTE OF SOLID STATE PHYSICS   (China)

Author keywords

Chemical solution deposition; Film; Magnetoresistance; Manganites

Indexed keywords

DEPOSITION; GRAIN SIZE AND SHAPE; LANTHANUM COMPOUNDS; MAGNETORESISTANCE; POLYCRYSTALLINE MATERIALS; SILICON; SUBSTRATES; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

CHEMICAL SOLUTION DEPOSITION; MAGNETIC MEASUREMENTS; MANGANITES; TRANSPORT MEASUREMENTS;

THIN FILMS;

EID: 33751434533     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2006.03.030     Document Type: Article

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