Real time process control and monitoring in multi-layer filter deposition

Optics InfoBase Conference Papers

Volumn , Issue , 2004, Pages

  Dligatch, Svetlana ^a   Netterfield, Roger P ^a  

^a CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL AND MONITORING; DEPOSITION CONTROL; MULTI-LAYERS; REAL- TIME; REAL-TIME DEPOSITION; REAL-TIME PROCESS CONTROL; REAL-TIME PROCESS MONITORING; SPECTROPHOTOMETRIC MONITORING; SUB NANOMETERS;

DEPOSITION;

EID: 33751370259     PISSN: None     EISSN: 21622701     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

1. nded., McGraw-Hill, 1994.
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3. Sullivan, B T A Dobrowolski, J A A Clarke, G A Akiyama, T A Osborne, N A Ranger, M A Howe, L A Matsumoto, A A Song, Y A Kikuchi, K F Manufacture of complex optical multilayer filters using an automated deposition system, J Vacuum V 51, N 4, P 647-654.
4. TFCalc by Software Spectra, Inc., 14025 N.W. Harvest Lane, Portland, OR 97229 USA.
5. R.M.A. Azzam and N.M. Bashara, Ellipsometry and Polarised Light, North Holland, Amsterdam, 1977.
6. F.A. Schmidt, "Use of ion beam assisted deposition to modify the microstructure and properties of thin films", Int. Mater. Rev., 35 (1990) 61-128.
7. P.J. Martin, H.A. Macleod, R.P. Netterfield, C. G. Pacey, and E. G. Sainty, "Ion-beam-assisted deposition of thin films". Applied Optics 22, 178-184 (1983).
8. Johs, B.; Herzinger, C.; Dinan, J.H.; Cornfeld, A.; Benson, J.D.; Doctor, D.; Olson, G.; Ferguson, I.; et. al. Real-time monitoring and control of epitaxial semiconductor growth in a production environment by in situ spectroscopic ellipsometry, Thin Solid Films, Volume: 313-314, February 13, 1998, pp. 490-495.