Fabrication of a multilayered low-temperature cofired ceramic micro-plasma-generating device

International Journal of Applied Ceramic Technology

Volumn 3, Issue 6, 2006, Pages 413-418

  Baker, Amanda ^a   Randall, Clive ^a   Stewart, Randall ^b   Fantazier, Richard ^b   Wise, Fred ^c  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b RD Imagetech Inc   (United States)

^c Wise Electronic Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS; COST EFFECTIVENESS; ELECTRODES; LOW TEMPERATURE PROPERTIES; MICROSTRIP LINES; PLASMA DEVICES;

DIELECTRIC LAYER THICKNESS; ELECTRODE DESIGN; ELECTRODE INK; LAMINATION METHODS; LOW-TEMPERATURE COFIRED CERAMIC; MESOSCALE MICROSYSTEMS; MICROPLASMA-GENERATING DEVICE;

PLASMA APPLICATIONS;

EID: 33751342941     PISSN: 1546542X     EISSN: 17447402     Source Type: Journal    
DOI: 10.1111/j.1744-7402.2006.02104.x     Document Type: Article

References (6)

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6. D. L. Wilcox Sr. and M. Oliver, "LTCC, an Interconnect Technology Morphing into a Strategic Microsystem Integration Technology," Proceedings of the IMAPS Advanced Technology Workshop, Providence, RI, May 2-3, 2002.