Treatment of optoelectronic industrial wastewater containing various refractory organic compounds by ozonation and biological method

Journal of the Chinese Institute of Chemical Engineers

Volumn 37, Issue 5, 2006, Pages 527-533

  Lin, Sheng H ^a   Chang, Chuan S ^b  

^a YUAN ZE UNIVERSITY   (Taiwan)

^b AU OPTRONICS CORPORATION   (Taiwan)

Author keywords

Gas induced ozonation; Optoelectronic wastewater; Sequencing batch reactor; TFT LCD

Indexed keywords

ACTIVATED SLUDGE PROCESS; CHEMICAL OXYGEN DEMAND; CHEMICAL REACTORS; LIQUID CRYSTAL DISPLAYS; OXIDATION; OZONIZATION; REFRACTORY MATERIALS; REMOVAL; THIN FILM TRANSISTORS;

GAS-INDUCED OZONATION; OPTOELECTRONIC WASTEWATER; SEQUENCING BATCH REACTOR;

WASTEWATER TREATMENT;

ACTIVATED SLUDGE PROCESS; CHEMICAL OXYGEN DEMAND; CHEMICAL REACTORS; LIQUID CRYSTAL DISPLAYS; OXIDATION; OZONIZATION; REFRACTORY MATERIALS; REMOVAL; THIN FILM TRANSISTORS; WASTEWATER TREATMENT;

EID: 33751178165     PISSN: 03681653     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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