Ultra high density HfO2 nanodots memory for scaling

21st IEEE Non-Volatile Semiconductor Memory Workshop 2006, NVSMW 2006

Volumn 2006, Issue , 2006, Pages 58-59

  Wakai, H ^a   Kobayashi, M ^a   Kumise, T ^a   Yamaguchi, M ^a   Nakanishi, T ^a   Tanaka, H ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33751068021     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2006.1629493     Document Type: Conference Paper

References (5)

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4. Y-H. Lin et al., IEDM Tech. Dig. pp. 1080-1083, 2003.
5. T. Sugizaki et al., Proc. VLSI Sympo. Tech. Dig. pp. 27-28, 2004.