A simple route to the water-repellent surface based on chemical N modified Ti-O structure films

Surface and Coatings Technology

Volumn 201, Issue 6, 2006, Pages 3606-3610

  Liu, Baoshun ^a   Zhao, Xiujian ^a   Wen, Liping ^a  

^a WUHAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Chemical N modified TiO2 film; Hydrophobicity; Magnetron sputtering; Wettability

Indexed keywords

CHEMICAL MODIFICATION; CONTACT ANGLE; HYDROPHOBICITY; MAGNETRON SPUTTERING; TITANIUM OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

WATER-REPELLENT SURFACE; WETTABILITY;

AMORPHOUS FILMS;

AMORPHOUS FILMS; CHEMICAL MODIFICATION; CONTACT ANGLE; HYDROPHOBICITY; MAGNETRON SPUTTERING; TITANIUM OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33751016643     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.137     Document Type: Article

References (15)

1. Tadanaga K., Kitamuro K., Matsuda A., et al. J. Sol-Gel Sci. Technol. 26 (2003) 7058
2. Hozumi A., and Takai O. Thin Solid Films 303 (1997) 222
3. Feng X.J., Feng L., Jin M.H., et al. J. Am. Chem. Soc. 126 (2004) 62
4. Feng X.J., Zhai J., and Jiang L. Angew. Chem., Int. Ed. 44 (2005) 5115
5. Zhou Z., Li F., Song Q., et al. Chem. Lett. 34 (2005) 1928
6. Fujishima A., and Honda K. Nature 238 (1972) 37
7. Reagan B.O., and Gräzel M. Nature 353 (1991) 737
8. Frank S.N., and Bard A.J. J. Phys. Chem. 81 (1977) 1484
9. Sun R.-D., Nakajima A., Fujishima A., et al. J. Phys. Chem., B 105 (2001) 1984
10. Miyauchi M., Nakajima A., Watanable T., et al. Chem. Mater. 14 (2002) 2812
11. Wang R., Hashimoto K., Fujishima A., et al. Nature 338 (1997) 431
12. Watanable T., Nakajima A., Wang R., et al. Thin Solid Films 351 (1999) 260
13. Ashahi R., Morikawa T., Ohwaki T., Aoki K., et al. Science 293 (2001) 269
14. Irie H., Washizuka S., Yoshino N., et al. Chem.Commun. (2003) 1298
15. Lee H.-Y., Park Y.-H., and Ko K.-H. Lamgmiur 16 (2000) 7289