Growth of ZnO nanorods by air annealing of ZnO films with an applied electric field

Surface and Coatings Technology

Volumn 201, Issue 6, 2006, Pages 2844-2848

  Parkansky, N ^a   Shalev, G ^a   Alterkop, B ^a   Goldsmith, S ^a   Boxman, R L ^a   Barkay, Z ^a   Glikman, L ^a   Wulff, H ^b   Quaas, M ^b  

^a TEL AVIV UNIVERSITY   (Israel)

^b UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

Annealing; Electric field; Nanorods; Zinc oxide

Indexed keywords

ANNEALING; DEPOSITION; ELECTRIC FIELDS; FILM GROWTH; HIGH RESOLUTION ELECTRON MICROSCOPY; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

AIR ANNEALING; ZINC OXIDE FILMS; ZINC OXIDE NANORODS;

ZINC OXIDE;

ANNEALING; DEPOSITION; ELECTRIC FIELDS; FILM GROWTH; HIGH RESOLUTION ELECTRON MICROSCOPY; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

EID: 33750977821     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.05.032     Document Type: Article

References (8)

1. Duan X., Huang Y., Agarval R., and Lieber C.M. Nature (London) 421 (2003) 241
2. Huang M., Mao S., Feick H., Xan H., Wu Y., Kind H., Weber E., Russo R., and Yang P. Science 292 (2001) 1897
3. Park W.I., Kim D.H., Jung S.W., and Yi G.C. Appl. Phys. Lett. 80 (2002) 4232
4. Heo Y.W., Norton D.P., Tien L.C., Kwon Y., Kang B.S., Ren F., Pearton S.J., and LaRoche J.R. Mater. Sci. Eng., R 47 (2004) 1
5. Huang M.H., Wu Y.Y., Feick H., Tran N., Weber E., and Yang P.D. Adv. Mater. (Weinheim, Ger) 13 (2001) 113
6. Li Y., Meng G.W., Zhang L.D., and Phillipp F. Appl. Phys. Lett. 76 (2000) 2011
7. Liu F., Cao P.J., Zhang H.R., Shen C.M., Wang Z., Li J.Q., and Gao H.J. J. Cryst. Growth 274 (2005) 126
8. Liu X., Wu X., Cao H., and Chang R.P.H. J. Appl. Phys. 95 (2004) 3141