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Volumn 47, Issue 2, 2007, Pages 361-367

A novel method of composite electroplating on lap in lapping process

Author keywords

Composite electroplating; Dress; Lapping process; Silicon wafer

Indexed keywords

CATHODES; COMPOSITE MATERIALS; CURRENT DENSITY; LAPPING MACHINES; MIRRORS; SILICON WAFERS; SURFACE ROUGHNESS; TINNING;

EID: 33750945618     PISSN: 08906955     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijmachtools.2006.03.003     Document Type: Article
Times cited : (18)

References (9)
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  • 3
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    • Colloidal silica polishing based on micromechanical removal action and its applications
    • Doy T.K. Colloidal silica polishing based on micromechanical removal action and its applications. Sensors and Materials 3 (1988) 153-167
    • (1988) Sensors and Materials , vol.3 , pp. 153-167
    • Doy, T.K.1
  • 4
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    • Improvement of conventional polishing conditions for obtaining super smooth surfaces of glass and metal works
    • Kasai T., Horio K., Doy T.K., and Kobayashi A. Improvement of conventional polishing conditions for obtaining super smooth surfaces of glass and metal works. Annals of CIRP 39 (1990) 321-324
    • (1990) Annals of CIRP , vol.39 , pp. 321-324
    • Kasai, T.1    Horio, K.2    Doy, T.K.3    Kobayashi, A.4
  • 5
    • 33750951034 scopus 로고
    • The effect of eccentric loading of optical flats during grinding and polishing
    • Rumsay N. The effect of eccentric loading of optical flats during grinding and polishing. Journal of Scientific Instruments 32 (1955) 338-339
    • (1955) Journal of Scientific Instruments , vol.32 , pp. 338-339
    • Rumsay, N.1
  • 7
    • 58149208117 scopus 로고
    • Mirror surface grinding of silicon wafer with electrolytic in-process dressing
    • Ohmori H., and Nakagawa T. Mirror surface grinding of silicon wafer with electrolytic in-process dressing. Annals of CIRP 39 (1990) 329-332
    • (1990) Annals of CIRP , vol.39 , pp. 329-332
    • Ohmori, H.1    Nakagawa, T.2
  • 8
    • 0001259859 scopus 로고
    • Electrolytic in-process dressing (ELID) grinding technique for ultraprecision mirror surface machining
    • Ohmori H. Electrolytic in-process dressing (ELID) grinding technique for ultraprecision mirror surface machining. International Journal of JSPE 26 (1992) 273-278
    • (1992) International Journal of JSPE , vol.26 , pp. 273-278
    • Ohmori, H.1
  • 9
    • 0242522372 scopus 로고    scopus 로고
    • Infeed grinding of silicon wafers applying electrophoretic deposition of ultrafine abrasives
    • Tani Y., Saeki T., Kobayashi K., and Sato Y. Infeed grinding of silicon wafers applying electrophoretic deposition of ultrafine abrasives. Annals of CIRP 47 (1998) 245-248
    • (1998) Annals of CIRP , vol.47 , pp. 245-248
    • Tani, Y.1    Saeki, T.2    Kobayashi, K.3    Sato, Y.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.