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Volumn 47, Issue 2, 2007, Pages 361-367
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A novel method of composite electroplating on lap in lapping process
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Author keywords
Composite electroplating; Dress; Lapping process; Silicon wafer
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Indexed keywords
CATHODES;
COMPOSITE MATERIALS;
CURRENT DENSITY;
LAPPING MACHINES;
MIRRORS;
SILICON WAFERS;
SURFACE ROUGHNESS;
TINNING;
COMPOSITE ELECTROPLATING;
LAPPING PROCESSES;
WEAR RATES;
ELECTROPLATING;
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EID: 33750945618
PISSN: 08906955
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ijmachtools.2006.03.003 Document Type: Article |
Times cited : (18)
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References (9)
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