Epitaxial growth of CoSi2 on Si(001) by reactive deposition epitaxy: Island growth and coalescence

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1340-1348

  Lim, C W ^a   Petrov, I ^a   Greene, J E ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

Cobalt disilicide; Reactive deposition epitaxy; Sputter deposition; Twinning

Indexed keywords

DENSITY (SPECIFIC GRAVITY); EPITAXIAL GROWTH; FILM GROWTH; NUCLEATION; SPUTTER DEPOSITION; TWINNING;

ADSORPTION SITES; COBALT DISILICIDE; CUBE-ON-CUBE ORIENTATION; REACTIVE DEPOSITION EPITAXY;

COBALT COMPOUNDS;

EID: 33750924813     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.03.043     Document Type: Article

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