Erratum: Application of the interface capacitance model to thin film relaxors and ferroelectrics (Applied Physics Letters (2006) 89 (196101))

Applied Physics Letters

Volumn 89, Issue 19, 2006, Pages

  Tyunina, M ^a   Levoska, J ^a  

^a UNIVERSITY OF OULU   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33750897065     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2385632     Document Type: Erratum

References (7)

1. J. M. Gregg, Appl. Phys. Lett. 89, 196101 (2006), preceding article.
2. M. Tyunina and J. Levoska, Appl. Phys. Lett. 88, 262904 (2006).
3. G. Rupprecht and R. O. Bell, Phys. Rev. 135, A748 (1964).
4. See, e.g., A. M. Bratkovsky and A. P. Levanyuk, Phys. Rev. Lett. 94, 107601 (2005) and references therein.
5. J. McAneney, L. J. Sinnamon, R. M. Bowman, and J. M. Gregg, J. Appl. Phys. 94, 4566 (2003).
6. M. Tyunina and J. Levoska, Ferroelectrics 294, 353 (2004).
7. P. Wurfel and I. P. Batra, Phys. Rev. B 0556-2805 10.1103/PhysRevB.8.5126 8, 5126 (1973); R. Kretschmer and K. Binder, Phys. Rev. B 20, 1065 (1979).