Growth of carbon nanostructure on a graphite substrate by plasma-enhanced chemical vapor deposition

Shinku/Journal of the Vacuum Society of Japan

Volumn 46, Issue 5, 2003, Pages 429-432

  Kawaki, Shunsuke ^a   Moon, Won Chul ^a   Yoshimura, Masamichi ^a   Ueda, Kazuyuki ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; GRAPHITE; METHANE; MICROWAVES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING;

CARBON NANOSTRUCTURES; GROWTH CONDITIONS; HIGHLY ORDERED PYROLYTIC GRAPHITE (HOPG);

NANOSTRUCTURED MATERIALS;

EID: 33750834831     PISSN: 05598516     EISSN: None     Source Type: Journal    
DOI: 10.3131/jvsj.46.429     Document Type: Article

References (3)

1. S. Iijima: Nature, 354 (1991) 56.
2. C. L. Tsai, C. F. Chen and L. K. Wu: Appl. Phys. Lett., 81 (2002) 721.