Investigation of alumina-silica films deposited by pulsed injection metal-organic chemical vapour deposition

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1830-1834

  Teiserskis, Arunas ^a,b   Zukova, Anna ^a   Gun'ko, Yurii K ^a   Grudinkin, Sergei ^a   Perova, Tatiana S ^a   Moore, Robert A ^a  

^a TRINITY COLLEGE DUBLIN   (Ireland)

^b VILNIUS UNIVERSITY   (Lithuania)

Author keywords

Aluminosilicate; Metal organic chemical vapor deposition; Optical properties; Pulsed injection; Surface topography

Indexed keywords

ALUMINA; INFRARED SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; PERMITTIVITY; SCANNING ELECTRON MICROSCOPY; SILICA; SURFACE TOPOGRAPHY;

ALUMINOSILICATE; CAPACITANCE-VOLTAGE (C-V) MEASUREMENTS; PULSED INJECTION;

THIN FILMS;

EID: 33750801074     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.007     Document Type: Article

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