Effect of nanoimprinted surface relief on Si and Ge nucleation and ordering

Microelectronics Journal

Volumn 37, Issue 12, 2006, Pages 1481-1485

  Kamins, T I ^a   Yasseri, A A ^a   Sharma, S ^a   Pease, R F W ^b   Xia, Q ^c   Chou, S Y ^c  

^a HEWLETT PACKARD LABORATORIES   (United States)

^b Stanford University   (United States)

^c Princeton University   (United States)

Author keywords

Epitaxy; Graphoepitaxy; Nucleation; Self assembled monolayers

Indexed keywords

COATINGS; DIFFUSION; EPITAXIAL GROWTH; NUCLEATION; SILICA; SURFACE STRUCTURE;

GRAPHOEPITAXY; NANOIMPRINTING; RANDOM NUCLEATION; SURFACE DIFFUSION;

NANOTECHNOLOGY;

EID: 33750739766     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2006.05.023     Document Type: Article

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