Optical characterization and microstructure of BaTiO 3 thin films obtained by RF-magnetron sputtering

Applied Surface Science

Volumn 253, Issue 1 SPEC. ISS., 2006, Pages 344-348

  Ianculescu, A ^a   Gartner, M ^b   Despax, B ^c   Bley, V ^c   Lebey, Th ^c   Gavrila R ^d   Modreanu, M ^e  

^a UNIVERSITY POLITEHNICA OF BUCHAREST   (Romania)

^b INSTITUTE OF PHYSICAL CHEMISTRY   (Romania)

^c CNRS   (France)

^d NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

^e UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

BaTiO 3 film; Ellipsometry; Microstructure; Optical properties; Rf sputtering

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; BARIUM COMPOUNDS; CRYSTAL MICROSTRUCTURE; ELLIPSOMETRY; ENERGY GAP; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SURFACE ROUGHNESS;

BRUGGEMAN EFFECTIVE MEDIUM APPROXIMATION (B-EMA); FILMS THICKNESS; RF SPUTTERING; SPECTROSCOPIC ELLIPSOMETRY (SE);

THIN FILMS;

EID: 33750579507     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.06.008     Document Type: Article

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