An XPS study on ion beam induced oxidation of titanium silicide

Applied Surface Science

Volumn 253, Issue 1 SPEC. ISS., 2006, Pages 381-384

  Osiceanu, P ^a  

^a INSTITUTE OF PHYSICAL CHEMISTRY   (Romania)

Author keywords

"In depth" chemical states; Ion beam oxidation; Oxidized altered layer; Titanium reactivity; Titanium silicide; XPS depth profiling

Indexed keywords

CONCENTRATION (PROCESS); FILM GROWTH; ION BEAMS; OXIDATION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

"IN DEPTH" CHEMICAL STATES; ION BEAM OXIDATION; OXIDIZED ALTERED LAYERS; TITANIUM REACTIVITY; TITANIUM SILICIDE;

TITANIUM COMPOUNDS;

EID: 33750510504     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.06.018     Document Type: Article

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