XRR and GISAXS study of silicon oxynitride films

Applied Surface Science

Volumn 253, Issue 1 SPEC. ISS., 2006, Pages 33-37

  Bernstorff, S ^a   Dubcek P ^b   Pivac, B ^b   Kovacevic I ^b   Sassella, A ^c   Borghesi, A ^c  

^a SINCROTRONE TRIESTE   (Italy)

^b RUDER BO KOVI INSTITUTE   (Croatia)

^c UNIVERSITY OF MILANO BICOCCA   (Italy)

Author keywords

Silicon oxynitride films; Small angle X ray scattering; X ray reflectivity

Indexed keywords

CARRIER CONCENTRATION; DIELECTRIC MATERIALS; GATES (TRANSISTOR); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON COMPOUNDS; X RAY SCATTERING;

INHOMOGENEITIES; SILICON OXYNITRIDE FILMS; SMALL ANGLE X RAY SCATTERING; X RAY REFLECTIVITY;

THIN FILMS;

EID: 33750505684     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.05.068     Document Type: Article

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