Epitaxial engineered solutions for ITRS scaling roadblocks

Materials Science and Engineering: B

Volumn 134, Issue 2-3 SPEC. ISS., 2006, Pages 154-158

  Harper, Robert ^a  

^a IQE INC   (United States)

Author keywords

Engineered substrates; Epitaxy; Mobility enhancement; Raised source drain; Scaling; Strained silicon; Thermal management

Indexed keywords

CMOS INTEGRATED CIRCUITS; EPITAXIAL GROWTH; STRAIN; SUBSTRATES; SURFACES; THERMOANALYSIS;

ENGINEERED SUBSTRATES; MOBILITY ENHANCEMENT; RAISED SOURCE/DRAIN; SCALING ROADBLOCKS; STRAINED SILICON; THERMAL MANAGEMENT;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 33750367831     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2006.07.021     Document Type: Article

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